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Self-standing 6-inch rapid annealing furnace

Rapid annealing furnace RTP-3S06 series uses infrared radiation heating technology to achieve rapid heating and cooling of large size samples (6 inches). It can be used for rapid heat treatment (RTP), rapid thermal annealing (RTA), rapid thermal oxidation (RTO), rapid thermal nitriding (RTN) and metal alloying semiconductor processes.
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Model RTP-3S06
Maximum Temperature 1200℃
Maximum Heating Rate 150℃/s
The Fastest Cooling Rate 1200℃--400℃:30℃/s(Under Certain Conditions)
400℃--200℃:10℃/s(Under Certain Conditions)
Temperature Control Accuracy ±0.5℃
Uniformity of Temperature Field ≤1.5%(Set Temperature)
Cavity Cooling Independent Water Cooling
Substrate Cooling Nitrogen Purge
Gas Flow MFC Control
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Features

● Measurable large-size samples: the maximum size of a single-chip sample that can be tested is 4 inches (100mm).

● Fast temperature control and high vacuum: the highest heating rate can reach 100℃/s, and the vacuum degree can reach 10Pa.

● Measurable large-size samples: The maximum size of applicable samples is 4 inches (100mm).

● Fast temperature control and high vacuum: the highest heating rate can reach 150℃/s, and the vacuum degree can reach 10-3Pa.

● Program setting and gas path expansion: It can realize the precise control of different temperature sections, carry out automatic transfer of the cooling section, and can save the process menu for easy recall. MFC is used to precisely control the gas flow to achieve heat treatment under different atmospheres (vacuum, nitrogen, etc.).

● Fully automatic intelligent control: Fully automatic intelligent control is adopted, including temperature, time, gas flow, vacuum, cooling water, etc. can be automatically controlled.

● Ultra-high safety factor: Three safety measures are adopted to protect the safe temperature opening of the furnace door, the thermostat opening authority protection and the equipment emergency stop safety protection to ensure the safety of the equipment in all aspects.

Applications

● Rapid heat treatment, rapid annealing, rapid thermal oxidation, rapid thermal nitriding

● Ion implantation/contact annealing

● SiAu, SiAl, SiMo alloying

● Solar cell bonding

● Resistance sintering

● Heat treatment of low dielectric materials

● Crystallization and densification

● Other thermal process requirements

Keyword:
Rapid annealing furnace
RTP

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Self-standing 6-inch rapid annealing furnace
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