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Infrared Annealing Furnace (RTP-3S01)

The infrared annealing furnace RTP-3S01 adopts infrared radiation heating technology and a high-precision temperature control system, which can realize rapid heating and annealing of samples, which plays an important role in RTP research related to new materials.
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Model RTP-3S01
Temperature Range RT~1200℃
Maximum Heating Rate 50℃/s
Temperature Uniformity ＜1% Target Temperature
Temperature Control Use industrial-grade thermostat, temperature control accuracy +/-0.1℃
Temperature Sensor Standard K-type Thermocouple
Cooling Rate 1200℃-400℃，~30S
400℃-200℃，~25S
Maximum Sample Size W20 x L20 x T2 (mm)
Host Size W420X L320X H220 (mm)
Host Weight 20.5kg

 

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Features
● Fast heating and cooling: The highest controllable heating rate can reach 50 ℃/s, and it can reach 100 ℃/s under certain conditions. The cold wall water cooling design can achieve a large cooling rate, which can reach 30 ℃/s under certain conditions.
● Precise temperature control: Industrial-grade temperature controller is used for PID precise temperature control, the target temperature and the set temperature curve are highly consistent, and the temperature can be accurately controlled from room temperature to 1200 ℃.
● Adapt to a variety of process environments: to meet the heat treatment under a variety of process atmospheres (nitrogen, argon, etc.). At the same time, through the optional vacuum pump, annealing can be carried out under vacuum conditions, and the maximum vacuum degree can reach 10-3Pa.
● Equipped with an observation window: Through the observation window, you can observe the changes of the sample during the heat treatment in real time. At the same time, in-situ test analysis can be performed in combination with related test methods.
● Ultra-high safety factor: The furnace wall over-temperature alarm system and the cooling water flow alarm system are adopted to ensure the safety of the instrument in all aspects.
Applications
● Crystallization annealing of strong inducer film
● Diffusion annealing after ion implantation
● Research on firing and annealing conditions of semiconductor materials
● Rapid thermal annealing, thermal oxidation and thermal nitriding
● Electrode alloying
● Crystal orientation and hardening
● Vapor deposition of graphene etc.
● Epitaxial growth of carbon nanotubes, etc.
● Single crystal substrate heat treatment
Customer Case
● South China University of Technology
● Shanghai Institute of Microsystems, Chinese Academy of Sciences
● Hefei National Research Center for Microscale Material Science, University of Science and Technology of China
Keyword:
Annealing furnace
RTP
rapid annealing
infrared annealing
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